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Invisix Measuring Systems
N
N 51.438° E 5.475°
v.2026.04
We're Invisix

Chipmakers can't build what they can't see.

Technology
SXR Metrology
Founded
Eindhoven
·
2025
Stage
Post-seed

As transistors shrink and stacks become 3D, visible light can no longer resolve what's inside. At Invisix, we shrink the wavelength of illumination to extend Moore's law.

technology
§ The spectrum

Where visible light falls short, we push further.

As advanced 3D devices outpace the limits of optical metrology, we extend measurement into the soft x-ray regime matching the wavelength of our tools to the true scale of the structures themselves.

Electromagnetic spectrum visualization showing wavelengths from radio waves through visible light to gamma rays, with soft
§ Capabilities

Three stages of insight.

A single, closed pipeline from photon to process-control signal, built for high-volume manufacturing.

01 · Illuminate

Illuminate.

A laser-like, soft x-ray light source with wavelength range matched to device scale yielding information-rich signals.
02 · Infer

Infer.

Reconstruct the detailed 3D geometries of advanced devices (GAA, CFET) from diffracted light at high throughput.
03 · Control

Control.

Feedback into the fab. Process control and yield improvement at the cadence of high-volume manufacturing.
Optical fiber bundle reflecting light through a grid surface into a storage device with directional arrows indicating data
§ 03 / Impact
10
+ yrs
De-risking the core SXR technology stack
100
+
Pending & issued patents
1.5K
+
Publication citations
1
x
Highly relevant Nobel Prize in Physics
§ Technology

Metrology solutions for the most challenging 3D problems in next-generation device manufacturing.

Our products facilitate online process control in high volume:

/ 01

3D profile metrology

Logic · dram
  • Simultaneously infer >4x more parameters than OCD
  • Measure details of individual nanosheets where visible light can only see averages to control demanding lateral timed etch and 3D conformal deposition
  • Reveal detailed profiles vs. depth on the most challenging etch steps in 4F2 DRAM process flows
  • Dramatically reduce calibration demand compared to visible light due to increased signal information content and decreased sensitivity to material property nuisances
/ 02

Device Pitch Overlay

ADI · AEI
  • Eliminate target design. Measure product unit cells, after develop or after etch.
  • Eliminate mark to device offsets.
  • Measure multiple overlays simultaneously, enabling real estate re-use.
/ 02

Unpatterned Film Stack Characterization

HVM
  • Characterize CFET mandrels

Chips are like 200 story miniature skyscrapers, built one floor at a time. Metrology with enough resolution to see inside the building is needed at every floor. Visible light has run out of steam. By shrinking the wavelength, Invisix brings the future into focus

§ About us

A diverse team committed to bringing the leading edge into focus.

+

years of successful de-risking

+

Licensed patents from ASML

+

publication citations

highly relevant Nobel Prize in Physics

Christina Porter

CO-Founder · CEO

Sietse van der Post

Co-Founder · CTO

Roald Dogge

COO

Hens van Ooijen

CFO
Team and Investors
§ The team

Physicists, engineers and software architects building the next generation of metrology tools in Eindhoven

Join us
§ Partner with us

Moore is more

More information content. More actionable intelligence. More yield.

Contact Invisix
View open roles · 7 positions
Quick Facts
Founded
2025
HQ
Eindhoven NL
Patents
100+
Stage
Post-Seed